Feigl, T.T.FeiglLauth, H.H.LauthYulin, S.S.YulinKaiser, N.N.Kaiser2022-03-032022-03-032001https://publica.fraunhofer.de/handle/publica/19991210.1016/S0167-9317(01)00530-5The effect of elevated temperature on the structural stability of Mo/Si, Mo2C/Si and Mo/Mo2C/Si/Mo2C (dMo2C = 0.6 nm) multilayers was investigated. The multilayers deposited by dc magnetron sputtering are annealed at temperatures ranging from 200 °C to 700 °C. The multilayer mirrors were designed for normal incidence reflectivity at about 13 nm wavelength. We achieved maximal normal incidence reflectivities of 61.8 % @ 13.0 nm wavelength for Mo2C/Si and 59.9 % @ 13.3 nm for Mo/Si multilayers having Mo2C diffusion barriers. While the reflectivity of Mo/Si multilayers decreased considerably after annealing above 300 °C the Mo2C/Si multilayers showed a superior thermal stability up to 500 C.enMo/SiMo2C/SiMo/Mo2C/Si/ Mo2Cmultilayersputteringthermal stabilityEUVL620621journal article