Dhavamani, AbithaAbithaDhavamaniWislicenus, MarcusMarcusWislicenusGerlich, LukasLukasGerlichUhlig, BenjaminBenjaminUhlig2022-03-132022-03-132016https://publica.fraunhofer.de/handle/publica/394044en621CVD-CoXN for advanced semiconductor metallizationpresentation