Knobloch, J.J.KnoblochKoch, M.M.Koch2022-03-092022-03-092002https://publica.fraunhofer.de/handle/publica/340208To determine the exact duration of liquid etching processes on spin-etchers an add-on device was developed which analyses optical properties of the wafer surface through a camera. The image processing is performed on normal PC hardware. A modular software structure is described, and the results of applying fuzzy methods in various parts of the algorithm are presented.enfuzzy controlimage processingend-point detectionsemiconductor equipment621Fuzzy control of a spin-etching processconference paper