Trost, M.M.TrostSchröder, S.S.SchröderFeigl, T.T.FeiglDuparre, A.A.DuparreTünnermann, A.A.Tünnermann2022-03-042022-03-042011https://publica.fraunhofer.de/handle/publica/22452810.1364/AO.50.00C148Scattering resulting from interface imperfections critically affects the image contrast and optical throughput of multilayer coatings for 13:5 nm. To investigate the scattering mechanisms, at-wavelength scattering measurements in combination with atomic force microscopy are analyzed for an in-depth characterization of the roughness properties. The different impacts of substrate finish and intrinsic thin film roughness on the scattering distribution are separated and analyzed in detail. Furthermore, a novel approach to characterize the roughness of large extreme ultraviolet substrates is presented, based on light scattering measurements at 442 nm.en620535journal article