Uhlig, H.H.UhligKaiser, U.U.KaiserVogel, S.S.Vogel2022-03-082022-03-081993https://publica.fraunhofer.de/handle/publica/302875The invention relates to a process for the production of thin films made of hafnium (IV) oxide, in particular for an optical interference coating system by reactive vapour deposition on a sibstrate on a vacuum in a vacuum chamber. The invention is based on the task that the least technically possible quantity of water vapour is permitted to be vapour-deposited in the vacuum chamber at a reactive gas pressure of less than 0.02 Pa, that the substrate temperature is maintainted at greater than 200 <degrees>Celsius during vapour deposition and that the vapour deposition rate is maintained at smaller than 0.3 nm s->-1.de608620patent1992-4231778