Under CopyrightMurakami, KatsuhisaKatsuhisaMurakamiRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerFrey, LotharLotharFreyHudec, BorisBorisHudecRosova, A.A.RosovaHueková, K.K.HuekováFröhlich, KarolKarolFröhlichKasikov, A.A.KasikovRamula, R.R.RamulaAarik, J.J.AarikHan, J.H.J.H.HanHan, S.S.HanLee, W.W.LeeSong, S.J.S.J.SongHwang, C.S.C.S.Hwang2022-03-1119.7.201216.10.20122012https://publica.fraunhofer.de/handle/publica/37616510.24406/publica-fhg-376165entunneling AFMTUNAconductive AFMcAFMhigh-kgrain and grain boundaryTiO2leakage current670620530Nanoscale characterization of TiO2 films grown by atomic layer depositionposter