Vergöhl, M.M.VergöhlMalkomes, N.N.MalkomesMatthee, T.T.MattheeBräuer, G.G.BräuerRichter, U.U.RichterNickol, F.-W.F.-W.NickolBruch, J.J.Bruch2022-03-092022-03-092000https://publica.fraunhofer.de/handle/publica/335799For the deposition of optical coatings on architectural glass, spectroscopic ellipsometry and spectral photometry have been applied. For the purpose of achieving a high competitiveness of manufacturing plants, high deposition rates as well as low scrap quanitities are important. The first can be obtained by using the mid-frequency (MF) sputtering technique developed in the beginning of the nineties for the deposition of highly isolating materials. The latter can be improved by using an effective plasma control and a monitor of the optical film properties. In order to obtain constant layer properties, not only the MF but also the directcurrent (DC) sputter process has to be stabilized within a relatively narrow process window, which necessitates a suitable plasma control as well as optical monitoring. Spectroscopic ellipsometry as well as spectral photometry are used for monitoring the optical properties of SnO2-based low-e-coatings on architectural glass. It is estimated that spectroscopic ellipsometry is distinctly more sensitive for monitoring the thicknesses of low-e coatings than spectral photometry.en667conference paper