Bröcker, LarsLarsBröckerSteppan, NickolasNickolasSteppanHain, KevinKevinHainWinzer, TristanTristanWinzerBenedikt, JanJanBenediktStankov, MarjanMarjanStankovLoffhagen, DetlefDetlefLoffhagenKlages, Claus-PeterClaus-PeterKlages2024-02-282024-02-282023-05-22https://publica.fraunhofer.de/handle/publica/462604Single-filament dielectric-barrier discharges at atmospheric pressure are used to investigate the effect of short residence times on the plasma polymerization of hexamethyldisiloxane (HMDSO) and hexamethyldisilane (HMDS), respectively. Experiments with precursor fractions between 25 and 2000 ppm in argon show that neither radicals are deposited nor surface reactions with the monomer take place. Possible pathways for the ionic deposition using HMDSO or HMDS are discussed.enionic depositionDBDsingle-filamentPECVDhexamethyldisilaneHMDSOpresentation