Haberger, K.K.HabergerHoffmann, K.K.HoffmannForster, M.M.ForsterRyssel, H.H.Ryssel2022-03-022022-03-021983https://publica.fraunhofer.de/handle/publica/172102enIonenstrahlLithographiePhotolackSimulation of the lithographic properties of ion-beam resistsbook article