Al-doped ZnO films deposited by reactive magnetron sputtering in r.f. mode with a single cathode and m.f. mode with dual cathodes

Kon, M.M.KonShigesato, Y.Y.ShigesatoSong, P.K.P.K.SongFrach, P.P.FrachKojima, H.H.KojimaSuzuki, K.K.Suzuki2022-03-092022-03-092000https://publica.fraunhofer.de/handle/publica/336943en667670620Al-doped ZnO films deposited by reactive magnetron sputtering in r.f. mode with a single cathode and m.f. mode with dual cathodesconference paper