Jakobs, S.S.JakobsDuparre, A.A.DuparreTruckenbrodt, H.H.Truckenbrodt2022-03-032022-03-031998https://publica.fraunhofer.de/handle/publica/19204510.1016/S0890-6955(97)00125-9Combination of atomic force microscopy and scattering measurements allows controlling the microstructure of substrates and optical thin films in the nanometer scale and of surface homogeneity over large areas. Results are presented of measurements on superpolished and conventionally polished substrates as well as on thin film fluoride coatings, demonstrating the capabilities of these measurement techniques.enatomic force microscopeDünne optische SchichtLichtstreuunglight scatteringOberflächenrauheitoptical thin filmsRasterkraftmikroskopiesurface roughness620628journal article