Benndorf, C.C.BenndorfBoettger, E.E.BoettgerFryda, M.M.FrydaHaubold, H.G.H.G.HauboldKöberle, H.H.KöberleKlages, C.-P.C.-P.Klages2022-03-032022-03-031991https://publica.fraunhofer.de/handle/publica/179871Metal containing a-C:H films are prepared by a combined PVD-CVD process. The electrical conductivity of these films is measured as a function of metal content and temperature. The varying counductivity behavior for films containing noble metals (Au and Cu) on the one hand and carbide forming metals (Nb and Ta) on the other is correlated to their microstructure.enelectrical conductivityelectrical propertieselektrische Eigenschaftelektrische LeitfähigkeitmicrostructureMikrostrukturpercolationPerkolation667620journal article