Erdmann, A.A.Erdmann2022-03-132022-03-132016https://publica.fraunhofer.de/handle/publica/40085710.1364/ISA.2016.IM4F.3The presentation reviews optics- and material-driven resolution enhancements in DUV and EUV projection lithography for semiconductor fabrication with special emphasis on the application of computational methods for the exploration and optimization of various technology options.en670conference paper