Cobalt silicide formation caused by arsenic ion beam mixing and rapid thermal annealing

Burte, E.P.E.P.BurteMin, Y.Y.MinPei-Hsin, T.T.Pei-HsinRyssel, H.H.Ryssel2022-03-032022-03-031991https://publica.fraunhofer.de/handle/publica/179766en670620530539Cobalt silicide formation caused by arsenic ion beam mixing and rapid thermal annealingjournal article