Benchmarking experiment of substrate quality including SmartSiCTM wafers by epitaxy in a batch reactor

Under CopyrightKallinger, BirgitBirgitKallingerHens, PhilipPhilipHensBerwian, PatrickPatrickBerwianKranert, ChristianChristianKranertAlbrecht, Kevin M.Kevin M.AlbrechtErlekampf, JürgenJürgenErlekampf2023-12-142023-12-142023-03-16https://publica.fraunhofer.de/handle/publica/458049https://doi.org/10.24406/h-45804910.24406/h-458049enBenchmarking experiment of substrate quality including SmartSiCTM wafers by epitaxy in a batch reactormeeting abstract