Mackens, U.U.MackensLüthje, H.H.LüthjeMescheder, U.U.MeschederMund, F.F.MundPongratz, S.S.Pongratz2022-03-082022-03-081988https://publica.fraunhofer.de/handle/publica/314750en621Application of SiC-X-ray masks for fabrication submicron devicesconference paper