Burenkov, A.A.BurenkovTietzel, K.K.TietzelHössinger, A.A.HössingerLorenz, J.J.LorenzRyssel, H.H.RysselSelberherr, S.S.Selberherr2022-03-092022-03-091999https://publica.fraunhofer.de/handle/publica/33362310.1109/SISPAD.1999.799258A new method for an accurate and CPU time efficient three-dimensional simulation of ion implantation is suggested in this work. The method is based on a combination of the algorithmic capabilities of the analytical and Monte-Carlo simulation methods. The Monte-Carlo method was used to generate a three-dimensional point response distribution function for the given implantation conditions. Using the numerically generated point response and an efficient algorithm for 3D convolution a point response based interface between the Monte-Carlo and analytical simulation methods was established. The combined simulation approach is able to accurately account for the channeling effect which is especially strong in case of a normal implantation into crystalline silicon. The combined simulation approach was implemented in the software for three-dimensional simulation of ion implantation and showed a reduction of the simulation time by a factor 10 and more compared to full scale Monte-Carlo simulation without sacrificing the simulation accuracy.en3D process simulationion implantationMonte Carlopoint response670620530conference paper