Development of HfO2 PEALD Thin Films for the Conformal Coating of High Power Laser Optics

Szeghalmi, AdrianaAdrianaSzeghalmiBeladiya, VivekVivekBeladiyaAlam, ShawonShawonAlamSchröder, SvenSvenSchröderRiese, S.S.Riese2023-02-012023-02-012022https://publica.fraunhofer.de/handle/publica/43466110.1364/OIC.2022.TC.22-s2.0-85139173498Here, we discuss the development of HfO2 PEALD thin films for laser applications. Antireflection coatings and dielectric mirrors for 355, 532 and 1064 nm wavelength and their laser damage resistance are presented.enAntireflection coatingsDevelopment of HfO2 PEALD Thin Films for the Conformal Coating of High Power Laser Opticsconference paper