Vergöhl, M.M.VergöhlRademacher, D.D.Rademacher2022-03-112022-03-112010https://publica.fraunhofer.de/handle/publica/37091610.1364/OIC.2010.TuD32-s2.0-84896752964SiO2 layers were deposited by pulsed reactive magnetron sputtering with cylindrical and planar dual magnetrons. The particle density in SiO2 films deposited at different process parameters is analyzed.enconference paper