Mu-m-resolved high resolution x-ray diffraction imaging for semiconductor quality control

Lübbert, D.D.LübbertBaumbach, T.T.BaumbachHärtwig, J.J.HärtwigBoller, E.E.BollerPernot, E.E.Pernot2022-03-032022-03-032000https://publica.fraunhofer.de/handle/publica/19668210.1016/S0168-583X(99)00619-92-s2.0-0034174017en620539Mu-m-resolved high resolution x-ray diffraction imaging for semiconductor quality controljournal article