Petzold, H.-C.H.-C.PetzoldBurghause, H.H.BurghausePutzar, R.R.PutzarWeigmann, U.U.WeigmannEconomou, N.P.N.P.EconomouStern, L.A.L.A.Stern2022-03-082022-03-081989https://publica.fraunhofer.de/handle/publica/316809To investigate the repair of clear defects on X-ray masks by ion-induced metal deposition, a photomask repair system was modified to allow for the localized deposition of tungsten from a gas jet of W(CO) sub 6 vapor. With this system, dense W layers could be deposited at rates of up to 4 nm/s; the X-ray opacity of layers having a thicknes of down to 200 nm was demonstrated by Y-ray lithographic resist exposures using synchrotron radiation.enfocussed ion beammask repairX-ray lithography621conference paper