Schiller, S.S.SchillerFörster, H.H.FörsterHötzsch, G.G.HötzschReschke, J.J.Reschke2022-03-022022-03-021981https://publica.fraunhofer.de/handle/publica/17057010.1016/0040-6090(81)90577-0en667670620541Advances in mechanical activation as a pretreatment process for vacuum depositionjournal article