Under CopyrightRommel, MathiasMathiasRommel2022-03-1429.11.20192019https://publica.fraunhofer.de/handle/publica/40570410.24406/publica-fhg-405704enfocused ion beamFIBresistless Ga+ beam lithographynanopatterning670620530Resistless Ga+ beam lithography for flexible prototyping of nanostructurespresentation