Nano- and micrometer scale surface topography modification of Si (100) by Ga focused ion beam irradiation

Under CopyrightRai, DeepaDeepaRaiStumpf, FlorianFlorianStumpfFrey, LotharLotharFreyRommel, MathiasMathiasRommel2022-03-129.4.20152015https://publica.fraunhofer.de/handle/publica/38821010.24406/publica-fhg-388210enfocused ion beam (FIB)ripple formation670620530Nano- and micrometer scale surface topography modification of Si (100) by Ga focused ion beam irradiationposter