Under CopyrightHuyeng, JonasJonasHuyengLang, S.F.S.F.LangEfinger, RaphaelRaphaelEfingerSchmidt, StefanStefanSchmidtSpribille, AlmaAlmaSpribilleBruge, D.D.BrugeWolf, AndreasAndreasWolfKeding, RomanRomanKedingDoll, OliverOliverDollClement, FlorianFlorianClement2022-03-1417.8.20192018https://publica.fraunhofer.de/handle/publica/40465410.1109/PVSC.2018.854794810.24406/publica-r-4046542-s2.0-85059904782Screen printed boron doping paste can be used as a cost-effective and highly flexible dopant source in silicon photovoltaics. In combination with a co-diffusion approach, it can help mitigate some of the increased costs advanced solar cell concepts inherit. Aiming at the fabrication of high efficiency back-contact back-junction solar cells, we investigate the limitations of direct structured application regarding minimal feature sizes. We find minimal feature sizes of 75 and 120 mm for n ++ - and p ++ -doped regions, respectively. We also demonstrate a fully compatible and homogeneous (DROS/ROS = 3% rel ) co-diffusion process, creating all dopings at once.enPhotovoltaikSilicium-PhotovoltaikPilotherstellung von industrienahen SolarzellenDrucktechnologieDotierstoff-Quelle621697conference paper