PEALD and pulsed CVD of Cobalt thin films using the precursor cyclopentadienylcobalt dicarbonyl

Hossbach, ChristophChristophHossbachShukla, ShashankShashankShuklaFischer, DustinDustinFischerReif, JohannaJohannaReifBönhardt, SaschaSaschaBönhardtGeidel, MarionMarionGeidelAlbert, MatthiasMatthiasAlbertBartha, Johann W.Johann W.Bartha2022-03-132022-03-132017https://publica.fraunhofer.de/handle/publica/399232en621PEALD and pulsed CVD of Cobalt thin films using the precursor cyclopentadienylcobalt dicarbonylposter