Polarity asymmetry of stress and charge trapping behavior of thin Hf- and Zr-silicate layers

Paskaleva, A.A.PaskalevaLemberger, M.M.LembergerBauer, A.J.A.J.Bauer2022-03-032022-03-032007https://publica.fraunhofer.de/handle/publica/21361010.1016/j.microrel.2006.11.018en670620530621Polarity asymmetry of stress and charge trapping behavior of thin Hf- and Zr-silicate layersjournal article