Barth, StephanStephanBarthBartzsch, HagenHagenBartzschGlöß, DanielDanielGlößFrach, PeterPeterFrachZywitzki, OlafOlafZywitzkiHerzog, ThomasThomasHerzogWalter, SusanSusanWalterHeuer, HenningHenningHeuer2022-03-122022-03-122014https://publica.fraunhofer.de/handle/publica/38587710.1109/ULTSYM.2014.0190The paper will report on the deposition and characterization of piezoelectric AlN and AlXSc1-XN films. Potential applications of the films are in ultrasonic microscopy, energy harvesting and SAW/ BAW filters. Special focus will be on the characterization of the influences of sputter parameters on the structure and the piezoelectric properties of AlXSc1-XN.enAlNAlScNpiezoelectricsputter depositionstress control620620666667670Effect of process parameters on structure and piezoelectric properties of AlN and AlXSc1-XN films deposited by pulsed magnetron sputteringconference paper