Steingrüber, R.R.SteingrüberFerstl, M.M.FerstlPilz, W.W.Pilz2022-03-032022-03-032001https://publica.fraunhofer.de/handle/publica/20052110.1016/S0167-9317(01)00497-XThe fabrication of micro-optical elements by electron-beam lithography and dry etching technique using a top conductive coating is presented. This conductive layer prevents the occurrence of charging effects during electron-beam exposure. Several different structures, mainly for use in micro-optics using various resist types, were realised in dielectric substrates. The use of top conductive coatings proved to be practical, reliable and simple.enelectron beam lithographymicro-opticsoptical fabricationoptical filmssputter etchingmicro-optical elementfabricationdry etchingtop conductive coatingcharging effectsdielectric substrateresist621journal article