Houbertz, R.R.HoubertzSchulz, J.J.SchulzFröhlich, L.L.FröhlichDomann, G.G.DomannPopall, M.M.PopallSerbin, J.J.SerbinChichkov, B.B.Chichkov2022-03-092022-03-092003https://publica.fraunhofer.de/handle/publica/342150Real 3-D sub-m lithography was performed with two-photon polymerization (2PP) using inorganic-organic hybrid polymer (ORMOCER®) resins. The hybrid polymers were synthesized by hydrolysis/polycondensation reactions (modified sol-gel synthesis) which allows one to tailor their material properties towards the respective applications, i.e., dielectrics, optics or passivation. Due to their photosensitive organic functionalities, ORMOCER®s can be patterned by conventional photo-lithography as well as by femtosecond laser pulses at 780 nm. This results in polymerized (solid) structures where the non-polymerized parts can be removed by conventional developers. ORMOCER® structures as small as 200 nm or even below were generated by 2PP of the resins using femtosecond laser pulses. It is demonstrated that ORMOCER®s have the potential to be used in components or devices built up by nm-scale structures such as, e.g., photonic crystals. Aspects of the materials in conjunction to the applied technology are discussed.en666conference paper