Brünger, W.H.W.H.Brünger2022-03-022022-03-021988https://publica.fraunhofer.de/handle/publica/175222Small spot ESCA with an Al K(alpha) X-ray source and a focussing monochromator has reached a spatial resolution of 150 mym. First experiments with illumination by synchrotron radiation without additional zone plate demagnification give the same spotsize but a 10 fold intensity. Experiments with Scanning XPS by moving an electron beam over the backside of a 2 mym thick Si membrane have shown the same count rates of photoelectrons as with an Al K(alpha) source but in a spot of only 4 mym. Scanning Auger microscopy gives a resolution of 50 nm for Si-Ta lines without topography and a resolution of 200 nm for a 1 mym high Au-step on a Si substrate at 10 keV primary electron energy. (IMT)enhigh resolution XPSsurface analysisX-ray lithography621journal article