Erdmann, A.A.ErdmannFühner, T.T.FühnerSchnattinger, T.T.SchnattingerTollkühn, B.B.Tollkühn2022-03-102022-03-102004https://publica.fraunhofer.de/handle/publica/34628810.1117/12.533215en670620530Towards automatic mask and source optimization for optical lithographyconference paper