Silicon nitride, silicon doxide thin insulating films, and other emerging dielectrics VIII

Sah, R.E.Deen, M.Zhang, J.F.Yota, J.Kamakura, Y.2022-03-102022-03-102005https://publica.fraunhofer.de/handle/publica/348934en621667Silicon nitride, silicon doxide thin insulating films, and other emerging dielectrics VIIIconference proceeding