Azhdast, M.H.M.H.AzhdastEichler, H.J.H.J.EichlerLang, K.-D.K.-D.LangGlaw, V.V.GlawKossatz, M.M.Kossatz2022-03-132022-03-132018https://publica.fraunhofer.de/handle/publica/40123410.1364/EUVXRAY.2018.JT5A.21Laser-induced forward transfer is a novel technique used for Aluminium implementing on wafer substrates in different gaseous environments: vacuum, room atmosphere, Argon and Arcal (F5). The laser pulse energy is optimized during the process.en621conference paper