Under CopyrightSchmitt, H.H.SchmittAmon, B.B.AmonPetersen, S.S.PetersenRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerRyssel, H.H.Ryssel2022-03-1023.1.20092008https://publica.fraunhofer.de/handle/publica/35932010.24406/publica-fhg-359320enUV nanoimprint lithographyresidual layerelectron deviceUV curing materialMOSFETtransistor670UV nanoimprint lithography process optimization for electron device manufacturing on nanosized scaleProzessoptimierung für die UV Nanoimprint Lithografie zur Herstellung nanoskaliger elektronischer Bauelementeposter