Evanschitzky, P.P.EvanschitzkyErdmann, A.A.ErdmannBesacier, M.M.BesacierSchiavone, P.P.Schiavone2022-03-092022-03-092003https://publica.fraunhofer.de/handle/publica/34247810.1117/12.504075en670620530Simulation of extreme ultraviolet masks with defective multilayersconference paper