Mack, SebastianSebastianMackLenes, MartijnMartijnLenesLuchies, Jan-MarcJan-MarcLuchiesWolf, AndreasAndreasWolf2022-03-062022-03-062019https://publica.fraunhofer.de/handle/publica/25895310.1002/pssr.201900064The work shows a process flow for the fabrication of bifacial 244 cm2 large p‐type solar cells with a passivating rear contact formed by low pressure chemical vapor deposition of an in‐situ boron doped polysilicon layer. Contacting of both polarities is achieved by screen printing of a silver paste and contact firing. Contact resistance values are shown to heavily depend on firing set temperatures. In a first experiment, conversion efficiencies up to 20.4% are demonstrated.enPhotovoltaikSilicium-PhotovoltaikOberflächen: KonditionierungPassivierungLichteinfangKontaktierung und StrukturierungPilotherstellung von industrienahen SolarzellenTOPConcontactsLPCVDpolysiliconprinting621530697P-Type Silicon Solar Cells with Passivating Rear Contact Formed by LPCVD p+ Polysilicon and Screen Printed Ag Metallizationjournal article