Raghuwanshi, MohitMohitRaghuwanshiSundarapandian, BalasubramanianBalasubramanianSundarapandianSingh, R.R.SinghRijil, T.T.RijilSuckow, S.S.SuckowLemme, M.C.M.C.Lemme2025-02-032025-02-042025-04-162025-02-032024https://publica.fraunhofer.de/handle/publica/48313910.1109/IPC60965.2024.10799525AlN addresses issues with traditional thin-film waveguides with its wide-bandgap and broad transparency window. This work demonstrates sputter-deposited AlN thin flms with ultra-low optical absorption, optimized via substrate and sputtering conditions. High-temperature deposition reduced oxygen content, improving transparency. Optical-loss measurements on waveguides confirmed record-low losses.enAINwaveguidessputteringCMOSconference paper