Guyenot, V.V.GuyenotRisse, S.S.RisseLude, C.C.Lude2022-03-082022-03-081998https://publica.fraunhofer.de/handle/publica/304058The method involves using an ink, an indian ink, a lacquer or a coloured or blackened adhesive as the opaque film (5). This is applied using a modified ink-jet method whereby droplets are sprayed on contactlessly. The covering film can be applied in drop-on-demand mode. The movement of the ink-jet spray head (6) relative to the microchip is controlled using data directly derived from the layout of the microchip. USE - E.g. for chips with photoelectric functions and other regions with structures sensitive to light. ADVANTAGE - Enables opaque film to be applied at low cost and with little labour.de608620Verfahren zur Herstellung eines fotoelektronischen Mikrochips, der eine lichtundurchlaessige Schicht aufweistMicrochip manufacturing method for photoelectronic microchip with opaque film - applying ink, indian ink, lacquer or coloured adhesive using modified ink-jet method whereby droplets are sprayed on contactlessly in drop-on-demand mode.patent1996-19654828