Thermal annealing effects on the mechanical properties of plasma-enhanced chemical vapor deposited silicon oxide films

Schliwinski, H.-J.H.-J.SchliwinskiSchnakenberg, U.U.SchnakenbergWindbracke, W.W.WindbrackeNeff, H.H.NeffLange, P.P.Lange2022-03-032022-03-031992https://publica.fraunhofer.de/handle/publica/18210810.1149/1.2069484en621541Thermal annealing effects on the mechanical properties of plasma-enhanced chemical vapor deposited silicon oxide filmsjournal article