Schiller, N.N.SchillerFahlteich, J.J.FahlteichFahland, M.M.FahlandSchönberger, W.W.Schönberger2022-03-112022-03-112008https://publica.fraunhofer.de/handle/publica/361744A novel concept for the all-in-vacuum, roll-to-roll deposition of multilayer barrier stacks has been presented. The basis of the concept is the in-line combination of magnetron sputtering and a magnetron PECVD-process. The magnetron PECVD process offers several benefits low working pressure of 0.5 Pa up to few Pa, thus allowing the in-line combination with sputtering process wide range of properties for SiO xC y layers high potential for large area processing by using dual magnetrons as power source high coating rates (> 400 nmm/min) Our basic concept allows an all-in-vacuum roll-to-roll deposition of multilayer barrier stacks. The process has been installed in a pilot-cale multi-chamber pilot roll to roll coater.en620conference paper