Liu, S.S.LiuFühner, T.T.FühnerShao, F.F.ShaoBarenbaum, A.A.BarenbaumJahn, J.J.JahnErdmann, A.A.Erdmann2022-03-112022-03-112010https://publica.fraunhofer.de/handle/publica/36755310.1117/12.846441This paper aims at identifying appropriate bottom anti-reflective coatings (BARCs) for double patterning techniques such as Litho-Freeze-Litho-Etch (LFLE). A short introduction into the employed optimization methodology, including variables, figures of merit, models and optimization algorithms is given. A study on the impact of a refractive index modulation caused by the first lithographic step is presented. Several optimization surveys taking the index modulation into account are set forth, and the results are discussed. In addition to optimization procedures aiming at optimizing one litho step at a time, a co-optimization study for both litho steps is proposed. Finally, two multi-objective optimization procedures that allow for a post-optimization exploration and selection of optimum solutions are presented. Numerous solutions are discussed in terms of their anti-reflective behavior and their manufacturing feasibility.enlithography simulationbottom anti-reflective coating (BARC)waferstack optimizationdouble patterning670620530conference paper