Effects of heavy metal contamination from corrosive gas and dopant handling equipment in silicon wafer processing

Klausmann, E.E.KlausmannEisele, K.M.K.M.Eisele2022-03-022022-03-021984https://publica.fraunhofer.de/handle/publica/170791enGetterwirkungLebensdauerMinoritaetstraegerPhosphorsilikatglasSchwermetallverunreinigung621667537Effects of heavy metal contamination from corrosive gas and dopant handling equipment in silicon wafer processingjournal article