Grimm, J.J.GrimmChlebek, J.J.ChlebekLoechel, B.B.LoechelEngler, K.D.K.D.Engler2022-03-082022-03-081994https://publica.fraunhofer.de/handle/publica/303082The invention relates to a device and a process for the duplication of X-ray masks by means of X-ray lithography, with which the precise adjustment and spacing of the 1x master mask and copy or heat sink and copy are possible. According to the invention, the adjustment and spacing of the 1x master mask and copy are performed by means of a movable autocollimating telescope and adjustable mask holders. The precise spacing of the heat sink and copy is enabled by a capacitive distance sensor on the heat sink. Copying processes for X-ray masks are necessary in particular for industrial applications since several copies of an X-ray mask are frequently required.de608621patent1992-4242632