Schnakenberg, U.U.SchnakenbergWallendszus, V.V.WallendszusHeuberger, A.A.HeubergerLischke, B.B.LischkeBenecke, W.W.BeneckeMüller, K.P.K.P.Müller2022-03-022022-03-021989https://publica.fraunhofer.de/handle/publica/177476Electron beam lithography is limited by the extremely low throughput of currently working machines. This paper describes a multiple beam forming unit for a new line printer type lithography system called High Speed, High Resolution Electron Lithography System (HISEL). The simultaneous use of a multiple number of individually controllable electron beams allows an essential reduction of the pattern transfer time. In a first version, a total number of 1024 electron beams is used. The control unit consists of two independent elements: the aperture plate (illuminated by an electron line type source) which forms a line of 1024 square -shaped (10x10)mym high 2 electron beams and the deflection plate with a corresponding set of 1024 microcapacitors. The capacitors allow an individual beam deflection, e.g. on-off switching of the beams. The fabrication is based on silicon micromechanics and X-ray lithography.en621journal article