Plasma-assisted atomic layer deposition of alumina at room temperature

Under CopyrightLemberger, MartinMartinLembergerFromm, TimoTimoFrommRommel, MathiasMathiasRommelBauer, A.J.A.J.BauerFrey, LotharLotharFrey2022-03-1119.7.20122012https://publica.fraunhofer.de/handle/publica/37616610.24406/publica-fhg-376166enPEALDALDAl2O3current conduction mechanisms670620530Plasma-assisted atomic layer deposition of alumina at room temperatureposter