Alunovic, M.M.AlunovicFunken, J.J.FunkenKreutz, E.W.E.W.KreutzSung, H.H.SungVoss, A.A.Voss2022-03-082022-03-081992https://publica.fraunhofer.de/handle/publica/319978The removal and the transfer of target materials, as the most important, physical processes in LPVD highly dominating the thin film formation on substrates, are investigated as a function of laser parameters and processing variables. The removal of the target material was measured by a microbalance, the transfer by emission vapour/plasma states are observed which are used in combination with the geometrical arrangement of target and substrate to generate various film structures in view of applications.endeposition techniqueemission spectralaser parameterphysical vapourtransmitting windowvacuum chamber621conference paper