Material-specific ptychographic imaging at 13.5 nm using a high-order harmonic source

Eschen, WilhelmWilhelmEschenLoetgering, LarsLarsLoetgeringSchuster, VittoriaVittoriaSchusterKlas, RobertRobertKlasKirsche, AlexanderAlexanderKirscheBerthold, LutzLutzBertholdSteinert, MichaelMichaelSteinertPertsch, ThomasThomasPertschGross, HerbertHerbertGrossKrause, MichaelMichaelKrauseLimpert, JensJensLimpertRothhardt, JanJanRothhardt2023-07-062023-07-062022https://publica.fraunhofer.de/handle/publica/44527110.1364/EUVXRAY.2022.EW6A.52-s2.0-85136822410We present a high-harmonic driven ptychographic EUV microscope operating at a wavelength of 13.5 nm. Sub-20 nm resolution is demonstrated and the accurate amplitude and phase images are harnessed to identify multiple materials of an integrated circuit.enMaterial-specific ptychographic imaging at 13.5 nm using a high-order harmonic sourceconference paper