Edge roughness of a 200 nm pitch resist pattern fabricated by ion projection lithography

Brünger, W.H.W.H.BrüngerBlaschke, J.J.BlaschkeTorkler, M.M.TorklerBuchmann, L.-M.L.-M.Buchmann2022-03-032022-03-031993https://publica.fraunhofer.de/handle/publica/18275710.1116/1.586995en621533Edge roughness of a 200 nm pitch resist pattern fabricated by ion projection lithographyjournal article