Ruthenocenes and half-open ruthenocenes: Synthesis, characterization, and their use as CVD precursors for ruthenium thin film deposition

Tuchscherer, A.A.TuchschererGeorgi, C.C.GeorgiRoth, N.N.RothSchaarschmidt, D.D.SchaarschmidtRüffer, T.T.RüfferWaechtler, T.T.WaechtlerSchulze, S.E.S.E.SchulzeOswald, S.S.OswaldGeßner, ThomasThomasGeßnerLang, H.H.Lang2022-03-042022-03-042012https://publica.fraunhofer.de/handle/publica/22985310.1002/ejic.201200601en546Ruthenocenes and half-open ruthenocenes: Synthesis, characterization, and their use as CVD precursors for ruthenium thin film depositionjournal article